- CMP Overview
- CMP Definition
- CMP Metrics and Variables
- CMP in the Fabrication of Integrated Circuits
- Formation of Interconnect Structures
- Planarization Goals
- Examples of CMP Applications
- CMP Advantages
- CMP Challenges
- CMP Defects
- CMP Business Environment
- Moores Law
- Sematech Technology Nodes
- Beyond 2D - Salvation of Moores Law?
- Business Environment for IC Manufacturing
- CMP Application Growth
- CMP Consumables
- Pad types, structure, properties, application
- Effect of temperature on pad properties
- Slurries types, applications, abrasives
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- Effect of shearing on slurry properties
- Conditioner disks
- Post CMP brushes
- COO for CMP consumables
- CMP consumable characterization:
- CMP Equipment
- Major types of the polishers
- Process parameters and variables
- Alternative CMP-eCMP
- Special applications CMP (low-k & TSV)
- Post CMP clean
- Scrubbing
- Mega sonic cleaning
- Particle-surface interaction
- Z potential, iso electric point
- CMP Future
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