Fundamentals of Chemical Vapor Deposition

This course is designed to provide a sound foundation in the fundamentals of how chemical vapor deposition (CVD) is used today in integrated circuit fabrication. Topics include chemical reactions and bonding, fundamentals of chemical vapor deposition, CVD dielectric films applications, CVD conducting films applications, basic CVD system architecture, APCVD systems, LPCVD systems, PECVD systems and CVD safety issues.

Next Available Course Dates:

August 10, 2009 ~ Dallas, TX

Register now for the next session!

We offer this and all courses as On Site Training


WHAT THE COURSE COVERS:
  • How CVD is used today in IC Fabrication
  • Fundamentals of CVD
  • Chemical Reactions and Bonding
  • CVD Dielectric Films Applications
  • CVD Conducting Films Applications
  • Basic CVD System Architecture
  • APCVD
  • LPCVD
  • PECVD
  • ALD Systems
  • CVD Safety Issues
  • CVD Process Applications, Issues and Fabrication Concepts

WHO SHOULD ATTEND?
  • Tool and Material Vendors
  • Field Service
  • Process Technicians
  • Process Operators
  • Equipment Engineers
  • Sales and Marketing
  • Quality
  • Engineering
  • Product Engineers
  • Production
  • Other professionals who would like an explanation of Chemical Vapor Deposition

This course was written in Plain English. Materials included in this class include a Chemical Vapor Deposition manual with several color illustrations, and a Periodic Table.


"We Exceed Your Expectations!"

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