Photolithography Process Control

Process control is presented in the context of optical lithography as applied to microelectronics and related technologies. The emphasis for this class will be on relevant lithography science, statistical methods, and the interplay between lithography science and statistical considerations. Much of the material for this class was developed by the instructor and is not available elsewhere.

We offer this and all courses as On Site Training


THIS COURSE WILL ENABLE YOU TO:
  • Correctly apply Statistical Process Control, even in those situations unique to the microelectronics industry, where the application of statistical process control is not straight forward


  • Distinguish those circumstances where statistical process control cannot be applied straight forwardly from those where it can


  • Separate equipment issues from other process factors


  • Control line widths, overlay, and defects


  • Choose a proper sample size


  • Address situations in which parameters distributions, such as overlay, are non-normal


  • Apply process control methods to research and development, as well as manufacturing


  • Identify process drift and to feedback corrections to the process


WHO SHOULD ATTEND?
  • Engineers, Technicians, and Managers who need to improve the level of process control in their lithography operation will find this course essential. Some prior knowledge of basic lithography science and statistical process control is assumed.

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