Photolithography Process Control

Process control is presented in the context of optical lithography as applied to microelectronics and related technologies. The emphasis for this class will be on relevant lithography science, statistical methods, and the interplay between lithography science and statistical considerations. Much of the material for this class was developed by the instructor and is not available elsewhere.

We offer this and all courses as On Site Training


THIS COURSE WILL ENABLE YOU TO:
  • Correctly apply Statistical Process Control, even in those situations unique to the microelectronics industry, where the application of statistical process control is not straight forward


  • Distinguish those circumstances where statistical process control cannot be applied straight forwardly from those where it can


  • Separate equipment issues from other process factors


  • Control line widths, overlay, and defects


  • Choose a proper sample size


  • Address situations in which parameters distributions, such as overlay, are non-normal


  • Apply process control methods to research and development, as well as manufacturing


  • Identify process drift and to feedback corrections to the process


WHO SHOULD ATTEND?
  • Engineers, Technicians, and Managers who need to improve the level of process control in their lithography operation will find this course essential. Some prior knowledge of basic lithography science and statistical process control is assumed.

INSTRUCTOR:

Harry J. Levinson is an AMD Fellow and Manager of AMD’s Strategic Lithography Technology Department, which is responsible for advanced lithographic technologies, such as immersion and EUV lithography. This department also characterizes exposure tool performance, often developing new techniques for doing so. Dr. Levinson started his career in Bipolar Memory Development at AMD, then spent some time at Sierra Semiconductor and IBM, before returning to AMD in 1994. During the course of his career, Dr. Levinson has applied lithography to many different technologies, including bipolar memories, 64Mb and 256Mb DRAM development, the manufacturing of applications-specific integrated circuits, thin film heads for magnetic recording, and advanced logic. He was one of the first users of 5´ steppers in Silicon Valley and was an early participant in 248 nm and 193 nm lithography. Dr. Levinson also served for several years as the chairman of the USA Lithography Technology Working Group that participates in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin film optical effects and metrics for imaging, to overlay and process control, and he is the author of two books, Lithography Process Control and Principles of Lithography


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