- Effects of Technology Scaling on VLSI Devices and Basic Review
- Review semiconductor physics and pn junctions. Introduce technology scaling trend.
- MOS Devices and Process Optimization
- Explain MOS capacitor, process and characterization; effects of gate oxide process on oxide integrity
- MOSFET Scaling Effects and Process/device Solutions
- Explain subthreshold characteristics, effective mobility and velocity saturation effects of submicron devices.
- Explain short-channel / narrow channel effects and their "reverse" effects; and the solutions
- Describe drain-induced barrier lowering (DIBL) and punchthrough
- Explain hot-electron effects and LDD Devices; gate induced drain leakage
- Describe CMOS latchup and the process / design solutions
- Explain poly-depletion and quantum mechanical effects
- Describe silicon-on-insulator technology and devices (e.g. FinFETs)
- Explain strained-Si and SiGe devices
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