Photomask Manufacturing and Technology Basics
This course provides attendees with a basic knowledge of photomasks.
The course focuses on mask technology and the challenges associated with design data conversions, lithography, process, metrology, inspection, and advanced ("Phase Shift") mask technology and manufacturing. Other topics such as the application of SPC, signature matching, etc., will also be covered.
| WHAT THE COURSE COVERS: |
- Have an understanding and appreciation of all mask making steps
- Understand mask specification and its impact
- Comprehend the constraints and impact of design conversion and replication on the mask
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- Compare the benefits of various mask writing tools and their respective writing strategies
- Identify potential challenges in current and future design, lithography, and metrology strategies
- Understand Phase Shift Mask Technology
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| WHO SHOULD ATTEND? |
- As there is a focus on design data conversion and its impact, those who work with advanced
semiconductor designs or deal with mask specification will find this course valuable.
- This material is intended for anyone who needs to learn about the basics of mask making
and where it fits in the microlithography process
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This is a one day course and each student will get a comprehensive
set of course notes.
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"We Exceed Your Expectations!"
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