Atomic Layer Deposition (ALD) Course Outline
​Discover how atomic-scale precision is revolutionizing semiconductor manufacturing with Atomic Layer Deposition (ALD) and Etching (ALE). This course provides a practical introduction to Atomic Layer Deposition, an essential technique in semiconductor manufacturing. You'll learn about ALD foundational concepts including growth, advantages, measurements, and more, chemical precursors for use in ALD, selected ALD processes, area-selective deposition, and atomic layer etching. Overall, the applications and chemistry used in semiconductor processing as it relates to ALD and ALE are heavily discussed. Professionals in the semiconductor industry that want to understand ALD technology and chemistry used in ALD and ALE are highly encouraged to attend. This course may especially benefit those who are directly working with precursor gases used in ALD and ALE processing, including gas and equipment providers.

Learning Objectives:

Understand foundational concepts of ALD.
Describe chemical precursors for use in ALD.
Identify selected SLD processes and their associated films and materials.
Explain area-selective deposition (ASD) and its uses.
Describe Atomic Layer Etching (ALE) concepts and understand its relationship to ALD.

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​Price: $10900 USD for the first 20 attendees