Plasma, RF, and Basic RF System Measurements Seminar – One Day

Target Audience –

New fab technicians and engineers, fab management, sales engineers, and administration. Class size of up to room capacity Prerequisite – None

 The goal of this seminar is that the students of all levels can come away with some understanding of the issues involved in transmitting RF energy to create plasmas in manufacturing tools and what tool measurements may be useful in understanding and troubleshooting these systems.

This fluency in discussing RF power delivery issues and being able to effectively discuss the real issues with RF power delivery to plasma will help focus on applying the correct solutions to many common issues.

Students will be taught what plasma is and does, what it is used for, and how it is used to deposit and etch thin films such as those used in semiconductor manufacturing and other industries. We will teach how RF power is generated and transmitted through system components and into the plasma chamber, and how RF energy creates plasma from the system gases.

Discussion will be held on how RF parameters and resulting plasma parameters can influence the outcomes of etch, CVD, and PVD processes. Further, we’ll discuss how the RF delivery components can influence the plasma properties which determine process results, on proper grounding and shielding, and on how to troubleshoot some common RF problems. We’ll also show the use of some RF instrumentation that can be used in the field to determine system state and to troubleshoot problems.

The seminar is five to six hours with mostly lecture and a short hands-on demo lab which will draw a few volunteers from the class to participate in some RF matching, as well as some plasma measurements and illustrations.Type your paragraph here.