Plasma Physics and Chemistry – One day

Target Audience – operators, process managers, engineers and technicians, plant managers and supply-chain managers that need a basic understanding and common vocabulary of RF plasma.

Prerequisite – Good and working knowledge of vacuum systems for process tools

Class Size – up to 20 attendees

Class Goal – To teach the audience what a plasma is and does, what it is used for, and how the plasma parameters can influence the outcomes of etch, CVD, and PVD processes.

Class is one day with mostly lecture and a 45-60-minute hands-on lab which will draw three volunteers from the class.