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PT  International, LLC  Semiconductor Training

EUV technology

This course provides attendees with a full overview of the fundamentals, current status, and technical challenges of EUV Lithography. Topics covered include EUV Sources, EUV Source Metrology, EUV Optics, EUV systems and patterning, and EUV Mask. We will begin with an overview of the history of EUVL and cover EUV sources, EUV source metrology and EUV optics. Next is a discussion of EUVL systems and patterning. We cover the fundamental components of EUV systems and address similarities and differences to optical lithography systems. This section also covers patterning issues including flare, LER, and resist performance. We continue with an exploration of EUVL Mask technology issues such as design, materials including reflective multilayers, process and metrology. Finally we conclude with a Status Review of EUVL.

The course will be based on the texts, EUV Lithography (2nd Edition, SPIE Press 2018) and EUV Sources for Lithography (SPIE Press 2006).

Course material includes a bound copy of lecture notes and a copy of EUV Lithography (2nd Edition, SPIE Press, 2018).


What the Course Covers:

  • History and basics of the development of EUV Lithography
  • Different EUV source types and current technical challenges of EUV source technology
  • EUV source metrology and source power measurements
  • EUV multilayer optics
  • EUV systems and patterning
  • Key components in EUV systems and current technical challenges
  • EUV mask technology and current technical challenges
  • Status and technical challenges of EUV Lithography for supporting high volume chip manufacturing
  • Commercial aspects of EUVL – how and when EUVL will be implemented, commercial opportunities and infrastructure landscape


Who Should Attend:

This material is intended for anyone who is involved in the development of EUV Lithography and/or other emerging lithography techniques, needs to understand the current technology status of EUV Lithography, and is interested in learning the fundamentals of this leading patterning technology for the 14 nm node and beyond. Those who are responsible for the development of the roadmap for lithography in manufacturing and making technology decisions will find this course valuable.


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Next Schedule Date and Location:

February 3, 2020 in Santa  Clara, CA


Price:$845 USD per person (10% discount if 3 or more students attend the same event from the same company)

Also can be conducted at your company site for $8,900 USD for up to 14 students


TO Register:

click here