Course Overview
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What You'll Learn
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Course Modules
Course Content
- RF Power Delivery in Plasma Systems Semiconductor Training A SEMI U Training Partner! RF Power Delivery in Plasma Systems – Two days Target Audience – process engineers and technicians, equipment engineers and technicians. Prerequisite – Plasma Physics and Chemistry Course Class Size – up to 14 attendees Class Goal – To teach the audience how RF energy is used to create a plasma, how RF power is generated and transmitted through systems components and into the plasma chamber and how the energy is coupled to the plasma. Emphasis on how RF parameters can influence the plasma properties which determine process results, on proper grounding and shielding, and on how to troubleshoot common RF problems. Class is two days of densely packed material with several short hands-on lab exercises and a two-hour lab session toward the end of the second day in which everyone is expected to actively participate. It involves taking measurements and running RF scenarios to demonstrate concepts taught and gets students comfortable with using and talking about RF power delivery and troubleshooting of RF issues.
Prerequisites
- – plasma physics and chemistry courseclass size – up to 14 attendeesclass goal – to teach the audience how rf energy is used to create a plasma, how rf power is generated and transmitted through syst
Who Should Attend
- Engineers
- Technicians
- Process Engineers
Expert Instructors
Industry veterans with 20+ years of experience in specialized topics and semiconductor technology.
What You'll Learn
- Plasma physics fundamentals
- Reactive ion etching (RIE) processes
- Atomic layer etching (ALE) techniques
- Process optimization and control
- Equipment design and operation
- Safety and troubleshooting procedures