Four-Point Probe

04 Thermal Processing, Implant, Doping & Oxidation

Definition

A four-contact electrical measurement in which current is forced through two probes and voltage is sensed with two separate probes, minimizing lead/contact resistance error when determining sheet resistance.

Application

Used for rapid wafer mapping of sheet resistance in implanted/diffused layers, conductive films, and process-monitor wafers.

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Four-Point Probe

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