Definition
A durable masking layer, often inorganic or carbon-based, used when photoresist alone lacks sufficient selectivity or mechanical/etch resistance for pattern transfer.
Application
Used in plasma etch and high-aspect-ratio patterning to preserve critical dimensions while transferring lithographic patterns into underlying films or stacks.
Related concepts
Evidence and further reading
- Evidence from semiengineering.comhttps://semiengineering.com/3d-nand-race-faces-huge-tech-and-cost-challenges/
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-sandvik-lpcvd-silicon-nitride