Definition
Plasma etch is a dry material-removal process in which a plasma supplies reactive species and/or energetic ions that remove selected wafer material through chemical and physical mechanisms.
Application
Used to transfer lithographic patterns into semiconductor, dielectric, and conductor layers and to form anisotropic, high-aspect-ratio features in logic and memory fabrication.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-reactive-ion-etcher-oxford-rie-plasmapro-80
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/icp-etching/