Plasma

06 Plasma, Etch & Pattern Transfer

Definition

A plasma is a fully or partially ionized gas containing charged particles; partially ionized plasmas also contain neutral species, and semiconductor process plasmas can contain reactive radicals and excited species.

Application

Used to drive dry etch, deposition, cleaning, ashing, doping, and surface-modification processes by controlling reactive species and ion bombardment at wafer surfaces.

Related concepts

Evidence and further reading