Definition
Plasma power is the electrical power coupled into a plasma source or wafer-bias circuit to sustain the discharge and control plasma and ion-energy characteristics.
Application
Used in plasma etch, deposition, and related processes to tune plasma density, ion energy, reaction rates, uniformity, selectivity, and damage risk; source and bias power may be controlled separately.
Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/icp-etching/
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-plasma-therm-corial-icp-hbr-cl-etcher