Definition
Electrical power supplied at radio frequencies to generate a processing plasma or drive a substrate bias.
Application
Adjusted to control plasma etching. In single-source RIE, it influences both ion density and energy; ICP-RIE offers separate source and bias power controls.
Related search terms
radio-frequency power
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Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/rie
- Evidence from sentech.comhttps://sentech.com/products/si-500/