Definition
Bias produced by radio-frequency power applied to a substrate electrode to control the energy of ions reaching the wafer.
Application
Used in plasma etching to tune ion bombardment and etched profiles; ICP-RIE tools can drive the substrate bias separately from the plasma-generating source.
Related search terms
radio-frequency bias; RF substrate bias
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Related concepts
Evidence and further reading
- Evidence from atomiclimits.comhttps://www.atomiclimits.com/2018/04/28/plasma-ald-and-substrate-biasing-the-impact-of-energetic-ions-on-film-properties/
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/icp-rie