Definition
Ion energy is the kinetic energy carried by an ion; in plasma processing it commonly refers to the energy of ions arriving at or striking the wafer surface.
Application
Controlling ion energy helps tune anisotropy, surface reactions, sputtering, selectivity, and plasma-induced damage during etch and deposition processes.
Related search terms
ion impact energy; incident ion energy
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/icpcvd
- Evidence from nist.govhttps://www.nist.gov/publications/comparison-identities-fluxes-and-energies-ions-formed-high-density-fluorocarbon