Definition
An inductively coupled plasma (ICP) is a high-density plasma sustained by RF power coupled inductively through a coil or antenna into a process chamber.
Application
ICP sources are widely used for semiconductor dry etching because plasma density and wafer bias can be controlled comparatively independently, supporting anisotropic profiles and demanding material etches.
Related search terms
ICP plasma; inductively coupled plasma etch
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Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/icp-rie
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/icp-etching/plasmapro-100-cobra-icp