Definition
In-situ metrology is measurement or monitoring performed within the process environment during semiconductor growth or processing, enabling real-time observation of material or process parameters.
Application
In-situ optical or thermal measurements can track film thickness, composition, growth, ALD reactions, or plasma behavior and support process control without relying solely on later ex-situ measurements.
Related search terms
in situ process metrology; real-time process metrology
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/situ-metrology-during-growth-compound-semiconductors-molecular-beam-epitaxy
- Evidence from nist.govhttps://www.nist.gov/programs-projects/nanocalorimetry-semiconductors-and-semiconductor-process-metrology