Definition
Ion implantation is a semiconductor doping and materials-modification process in which ionized species are accelerated to controlled energies and directed into a substrate.
Application
Ion implantation sets dopant species, dose, energy, and angle to form wells, source/drain extensions, threshold-adjust regions, and other engineered profiles before subsequent activation or damage-repair anneals.
Related search terms
ion implant; implantation
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/eu/en/semiconductor/products/processes/implant.html
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/tw/zh_tw/semiconductor/products/modify/implant/viista-trident.html