Definition
Implant angle is the controlled orientation of an ion beam relative to the wafer surface normal during ion implantation.
Application
Changing implant angle helps place dopants in three-dimensional device structures and manage channeling, shadowing, lateral placement, and profile uniformity.
Related search terms
implant tilt; implant tilt angle
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/product-library/viista-900-3d.html
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/eu/en/semiconductor/products/processes/implant.html