Definition
Implant energy is the kinetic energy assigned to ions in an ion-implantation beam and is a primary control on their penetration depth in the target.
Application
Fabs select lower or higher implant energies to place dopants at shallow or deeper depths while combining energy with dose, angle, and subsequent activation anneals.
Related search terms
implantation energy; beam energy
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/eu/en/semiconductor/products/processes/implant.html
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-quantum-leap-system-wins-best-product-award