Definition
A power supply that produces radio-frequency electrical output for a semiconductor processing plasma or its substrate bias.
Application
Supplies controlled power for plasma etching and deposition; in ICP-RIE, a separate RF generator can drive the substrate bias.
Related search terms
radio-frequency generator; RF plasma generator
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Related concepts
Evidence and further reading
- Evidence from advancedenergy.comhttps://www.advancedenergy.com/en-us/products/plasma-power-products/rf-plasma-generators/everest/
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/icp-rie