Definition
A semiconductor surface-preparation process that removes naturally formed surface oxide before a subsequent fabrication step.
Application
Used before epitaxy, contact formation, gate-stack processing, bonding, or other interface-sensitive steps to expose a controlled clean semiconductor surface.
Related search terms
native oxide strip; oxide preclean
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Related concepts
Evidence and further reading
- Evidence from cambridge.orghttps://www.cambridge.org/core/journals/mrs-online-proceedings-library-archive/article/abs/thermally-driven-insitu-removal-of-native-oxide-using-anhydrous-hydrogen-fluoride/816D82E70CAEE989F8CBE914A0626C5C
- Evidence from pure.psu.eduhttps://pure.psu.edu/en/publications/etching-of-silicon-native-oxide-using-ultraslow-multicharged-arsu/