Definition
Hydrofluoric acid (HF in aqueous solution) is a fluorine-containing acid used in semiconductor wet processing because it attacks silicon dioxide and related oxide films.
Application
Dilute HF and buffered oxide etch are used to remove native or deposited silicon oxide, prepare silicon surfaces, and perform sacrificial-oxide or cleaning steps in wafer fabrication.
Related search terms
hydrofluoric acid etch
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-spts-microetch-hydrofluoric-acid-vapor-etcher
- Evidence from nanoguide.stanford.eduhttps://nanoguide.stanford.edu/guide/equipment/wet-bench-cleanres-hf-wbcleanres-hf