Definition
A silicon–oxygen material; in conventional IC processing, the term commonly refers to silicon dioxide (SiO2), while nonstoichiometric SiOx films also occur.
Application
Used, especially as SiO2, for device and interconnect insulation and as a dielectric in gate and capacitor structures.
Related concepts
Evidence and further reading
- Evidence from tf.uni-kiel.dehttps://www.tf.uni-kiel.de/matwis/amat/elmat_en/kap_6/backbone/r6_2_1.html
- Evidence from tsapps.nist.govhttps://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=912682