Definition
A silicon–nitrogen dielectric used as a thin film in semiconductor processing; stoichiometric material is Si3N4, while deposited films can be nonstoichiometric SiNx.
Application
Used as an electrical insulator in gate structures and as a surface-passivation coating on semiconductor devices.
Related concepts
Evidence and further reading
- Evidence from nature.comhttps://www.nature.com/articles/srep28326
- Evidence from eprints.soton.ac.ukhttps://eprints.soton.ac.uk/481506/