Definition
Overlay metrology is the measurement and characterization of relative placement error between patterned semiconductor layers.
Application
Used after lithography and etch to monitor layer-to-layer placement, tune scanner/process corrections, and control overlay in high-volume manufacturing.
Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/products/metrology-and-inspection-systems/yieldstar-380g
- Evidence from ir.kla.comhttps://ir.kla.com/news-events/press-releases/detail/204/kla-tencor-announces-new-archer-500-overlay-metrology