Definition
Photoresist strip is the process of removing remaining photoresist film and associated residues from a wafer after the resist has served its patterning or masking function.
Application
Used after ion implantation or etch and at other process points to clear resist/residues and prepare the wafer surface for subsequent fabrication steps.
Related concepts
Evidence and further reading
- Evidence from lamresearch.comhttps://www.lamresearch.com/products/our-processes/strip-clean/
- Evidence from tel.comhttps://www.tel.com/product/zeta.html