Definition
Photoresist is a photosensitive material coated on a wafer whose solubility or chemical behavior is changed by exposure so selected regions can be removed during development.
Application
Used in lithography as the temporary imaging layer that receives the circuit pattern and protects or exposes selected wafer regions for subsequent fabrication steps.
Related concepts
Evidence and further reading
- Evidence from semiconductor.samsung.comhttps://semiconductor.samsung.com/support/tools-resources/dictionary/photoresist-printing-the-circuit-onto-the-wafer/
- Evidence from asml.comhttps://www.asml.com/en/news/press-releases/2003/asml-delivers-first-full-field-157-nm-tool-to-imec