Definition
Photoresist developer is the chemical process solution used after exposure to selectively dissolve the intended regions of photoresist and reveal the resist pattern.
Application
Used in lithography tracks after exposure to form patterned resist features before downstream etch, implantation, deposition, or other pattern-transfer operations.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-hmx-square-9-automatic-mask-develop-cr-etch
- Evidence from tel.comhttps://www.tel.com/product/act.html