Definition
Plasma ashing is a dry-strip process that uses plasma-generated reactive species to remove photoresist and organic residues from semiconductor wafers.
Application
Used after lithography, etch, or implantation to remove resist/residues while preparing wafer surfaces for subsequent processing; chemistry and plasma conditions are selected for the material stack.
Related concepts
Evidence and further reading
- Evidence from lamresearch.comhttps://www.lamresearch.com/product/gamma-product-family/
- Evidence from lamresearch.comhttps://www.lamresearch.com/products/our-processes/strip-clean/