Definition
Plasma damage is processing-induced degradation associated with plasma exposure in semiconductor manufacturing, including structural degradation of plasma-exposed ultra-low-k organosilicate films and charging-related degradation in MOS capacitors.
Application
Damage in semiconductor plasma processing can be characterized by measuring structural degradation and plasma-induced charging; charging measurements can predict MOS-capacitor degradation, and charging voltage is strongly affected by input RF power, chamber pressure, and plasma gas type.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/publications/non-uniform-structural-degradation-porous-organosilicate-films-exposed-plasma-etching
- Evidence from collaborate.princeton.eduhttps://collaborate.princeton.edu/en/publications/correlation-of-plasma-induced-charging-voltage-measured-in-situ-b-2/