Definition
Plasma potential is the electric potential of the quasi-neutral bulk plasma relative to a chosen reference; it is distinct from floating potential and from the voltage drop across a sheath.
Application
In semiconductor plasma processing, plasma-potential and sheath-voltage behavior influence ion-energy distributions at wafer surfaces and are monitored or modeled for process control and damage management.
Related concepts
Evidence and further reading
- Evidence from htx.pppl.govhttps://htx.pppl.gov/langmuir.html
- Evidence from nist.govhttps://www.nist.gov/publications/noninvasive-monitoring-ion-current-and-ion-energy-during-plasma-processing