Definition
Etch uniformity describes how consistently an etch removes material or produces target dimensions across a wafer, from wafer to wafer, or across a batch; it is commonly evaluated through variation in etch depth, rate, or critical dimension.
Application
Fabs monitor etch uniformity because center-to-edge or wafer-to-wafer variation can shift feature dimensions and reduce process margin and yield; advanced plasma tools actively control spatial etch behavior to improve repeatability.
Related search terms
Etch-rate uniformity; etch depth uniformity
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Related concepts
Evidence and further reading
- Evidence from lamresearch.comhttps://www.lamresearch.com/product/akara/
- Evidence from lamresearch.comhttps://www.lamresearch.com/products/our-processes/etch/