Etching

06 Plasma, Etch & Pattern Transfer

Definition

Etching is the selective removal of material from a semiconductor wafer to transfer a pattern or shape device structures. Semiconductor etch may use wet chemical reactions or dry/plasma processes such as reactive-ion etching.

Application

Etch steps define conductors, dielectrics, contacts, vias, trenches, and high-aspect-ratio structures after lithography, with process choices balancing rate, selectivity, anisotropy, profile control, and damage.

Related search terms

Semiconductor etch; wafer etch

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Related concepts

Evidence and further reading