Anisotropic Etch

06 Plasma, Etch & Pattern Transfer

Definition

Etching in which material removal is strongly direction-dependent, typically favoring the vertical direction so the transferred pattern has relatively steep sidewalls.

Application

Used to form contacts, trenches, vias and high-aspect-ratio features where lateral etching must be limited to preserve critical dimensions and profile shape.

Related search terms

Directional etch

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Related concepts

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