Definition
A batch thermal treatment in which wafers are held at elevated temperature for a controlled time and ambient to activate dopants, repair implantation damage, drive diffusion, densify films, or modify interfaces.
Application
Used where longer thermal budgets and batch throughput are acceptable, including dopant activation, oxidation-related treatments, and film/interface conditioning.
Related search terms
Furnace Anneal
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/semiconductor/products/processes/rapid-thermal-processing-treatments.html
- Evidence from tel.comhttps://www.tel.com/product/telindy.html