Definition
A short-duration wafer anneal that reaches a high process temperature rapidly and cools rapidly, limiting total high-temperature thermal exposure.
Application
Used after ion implantation to activate dopants and form shallow junctions while limiting unwanted dopant diffusion; it is also used for other short, tightly controlled thermal reactions.
Related search terms
Rapid thermal annealing
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-leads-advancement-rtp-new-xeplus-system
- Evidence from ir.appliedmaterials.comhttps://ir.appliedmaterials.com/news-releases/news-release-details/applied-materials-takes-rtp-technology-next-level-new-radiance