Definition
A rapid thermal annealing cycle with fast heating and cooling and little or no dwell at its peak temperature, reducing the time spent at high temperature.
Application
Used after ion implantation to activate dopants and form shallow junctions while limiting dopant diffusion.
Related search terms
Spike annealing
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from link.springer.comhttps://link.springer.com/article/10.1007/s11664-002-0031-9
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/semiconductor/products/modify/rapid-thermal-processing-treatments/vantage-radiance-plus-rtp.html