Definition
The physical length of the gate-controlled channel direction of a field-effect transistor, commonly denoted Lg.
Application
Used as a critical transistor geometry for device scaling, lithography/process control, and short-channel performance assessment.
Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/news-events/news/2007/12/new-paper-reveals-nanoscale-details-photolithography-process
- Evidence from imec-int.comhttps://www.imec-int.com/en/press/imec-reports-first-electrical-demonstration-integrated-forksheet-devices-extend-nanosheets