Definition
High-density plasma is a plasma regime or source configuration that produces a high concentration of charged particles, often while operating at relatively low process pressure.
Application
Semiconductor high-density plasma sources are used in dry etch and related plasma processing to obtain high ion/radical flux for features such as gates, contacts, isolation structures, and deep dielectric etches.
Related search terms
high density plasma source
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Related concepts
Evidence and further reading
- Evidence from hitachi-hightech.comhttps://www.hitachi-hightech.com/us/en/products/semiconductor-manufacturing/dry-etch-systems/microwave-ecr.html
- Evidence from spts.comhttps://www.spts.com/products/chip-manufacturing/etch