Definition
An ion source is the assembly in an ion implanter that ionizes source material and extracts charged ions to form the beam sent through the implantation beamline.
Application
Used to generate the selected dopant-ion species and beam current required for controlled semiconductor ion implantation.
Related search terms
implant ion source
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/jp/ja/glossary.html
- Evidence from axcelis.comhttps://www.axcelis.com/about_us_timeline/1986-2-2-2-2-2-2-2-2-2-2/