Definition
A controlled vapor-phase epitaxy reactor that delivers metal-organic precursors and reactive gases to a heated substrate to grow compound-semiconductor crystalline layers.
Application
Used for production epitaxy of III-V and other compound-semiconductor structures for lasers, LEDs, RF, power, and photonic devices.
Related search terms
metal-organic chemical vapor deposition reactor
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from ir.veeco.comhttps://ir.veeco.com/news-and-events/news-details/2025/Veeco-Launches-Lumina-MOCVD-System-Receives-Multi-Tool-Order-for-High-Volume-Production-of-Compound-Semiconductor-Products/default.aspx
- Evidence from ir.veeco.comhttps://ir.veeco.com/news-and-events/news-details/2025/Veeco-Receives-Multiple-Lumina-Systems-Order-from-Leading-Optical-Communications-Laser-Manufacturer/default.aspx