Definition
The controlled growth of a crystalline layer on a crystalline substrate with a defined crystallographic relationship between the deposited material and the underlying surface.
Application
Used to form high-quality semiconductor layers with controlled thickness, composition, doping and strain, including selective source/drain growth, channel engineering, silicon and compound-semiconductor structures and power-device epitaxy.
Related search terms
Epitaxial growth; epi growth; epi (industry shorthand)
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Related concepts
Evidence and further reading
- Evidence from asm.comhttps://www.asm.com/our-technology-products/epitaxy
- Evidence from asm.comhttps://www.asm.com/our-technology-products/epitaxy/intrepid-es