Definition
Point-of-use exhaust treatment that destroys or removes nitrogen trifluoride and related fluorinated process gases before semiconductor-tool exhaust is released downstream.
Application
Applied to semiconductor chamber-clean and other fluorinated-gas exhaust streams to reduce emissions of high-global-warming-potential gases; performance depends on the specific abatement system and process conditions.
Related search terms
nitrogen trifluoride abatement
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Related concepts
Evidence and further reading
- Evidence from newsroom.lamresearch.comhttps://newsroom.lamresearch.com/chamber-clean-cuts-co-32-percent
- Evidence from edwardsvacuum.comhttps://www.edwardsvacuum.com/en-uk/semiconductor/our-products/abatement/proteus