Definition
A process chamber is the chamber within semiconductor processing equipment where a wafer or substrate is exposed to controlled process conditions used to carry out a unit process.
Application
Used for semiconductor deposition processes such as epitaxy and chemical vapor deposition, where chamber temperature, pressure, gas delivery, and thermal or plasma energy are controlled to produce repeatable film properties and wafer results.
Related search terms
Processing chamber; Wafer process chamber
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Related concepts
Evidence and further reading
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/product-library/centura-epi-200mm.html
- Evidence from appliedmaterials.comhttps://www.appliedmaterials.com/us/en/semiconductor/products/create.html
Put this term into practice
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