Definition
An undesired localized lateral recess or profile distortion that develops near an interface or feature bottom during plasma etching.
Application
Controlled in semiconductor etch processes such as silicon-on-insulator deep etching, where notch-control capability helps maintain the intended feature profile near stopping interfaces.
Related search terms
etch notching
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Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/products/dsie/
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/technologies/icp-rie