Definition
A plasma-diagnostic technique that measures wavelength-resolved light emitted by excited species in a plasma, using spectral intensity changes to monitor plasma composition or process state.
Application
Used in semiconductor plasma etch and chamber-clean tools for endpoint detection, process monitoring, and plasma diagnostics.
Related search terms
optical emission spectroscopy
Search phrases help you find this entry; their meaning depends on the context shown here.
Related concepts
Evidence and further reading
- Evidence from plasma.oxinst.comhttps://plasma.oxinst.com/service-support/upgrades/endpoint-detectors
- Evidence from vanderbilt.eduhttps://www.vanderbilt.edu/vinse/instrumentation/deep-rie_oxford_plasmapro100-cobra/